The Influence of Chemical Structure of Model Epoxy Networks on Chemical Resistance

Abstract

Structural differences in cross-linked epoxy networks from the use of different isomers (ortho-, meta- and para-) of disubstituted aromatic diglycidyl ethers can have a dramatic effect on the polymer properties. By changing the disubstitution from meta- to para- it has been shown that there is a direct correlation between the diffusion of gasses and the symmetry of related polymers. The aim of this work is to investigate the influence of the chemical structure of aromatic diglycidyl ethers on the ability of the resulting amine-cured epoxy polymer networks to adsorb organic solvents. Pure diglycidyl ethers based on hydroquinone and catechol, have been synthesised in high purity and good yields using a process previously developed at Durham University which utilise elemental fluorine to produce hypofluorous acid. The diglycidyl ether of resorcinol is commercially available and readily purified via vacuum distillation. Using the pure epoxides model networks have been produced by reacting the diglycidyl ethers with the diamine 4,4’-methylenebis(cyclohexylamine) to produce highly cross-linked films. Analytical techniques including DSC, DMTA, TGA, FTIR, solid state NMR, thermodynamic testing, PALs and density measurements have been used to investigate the influence of polymer structure on the network properties. With these materials we are determining the effect of the different epoxide isomers on the chemical resistance of the polymers. The results obtained for the polymers shows consistency with those suggested by the literature which is that the meta- polymer has the best chemical resistance with the other isomers having similar results.